SPIE Advanced Lithography + Patterning San José

The SPIE Advanced Lithography + Patterning in San José is a leading global forum for the exchange of knowledge and innovations in the field of lithography and patterning. This annual event attracts experts from academia and industry who are dedicated to addressing the specific challenges of the semiconductor industry. Organized by SPIE, the international society for optics and photonics, the conference serves as a central platform for presenting and discussing the latest developments, research findings, and technological advances. As an international, nonprofit organization, SPIE promotes knowledge in the fields of optics and photonics through research, education, and the exchange of information. It supports scientists, engineers, and companies with conferences, professional journals, and training programs to advance innovations and progress in these technological fields.

The SPIE Advanced Lithography + Patterning includes a variety of conferences, courses, and an accompanying exhibition, where participants have the opportunity to learn about the latest product innovations, meet leading industry representatives, and establish valuable business contacts. The ideal mix of theoretical knowledge and practical application makes the event an indispensable meeting for professionals in the field of lithography.

The event covers a wide range of topics, including lithographic equipment, nanotechnology products, materials, abrasives, chemicals, software, optical components, microtechnology, cameras, and imaging systems. Other focal points include testing and measurement devices, microscopes, data processing software, processing hardware, optical coatings, thin films, detectors, sensors, as well as lasers and laser systems. This diversity of topics highlights the complexity and interdisciplinary nature of modern lithography technology and its applications.

A distinctive feature of the SPIE Advanced Lithography + Patterning is its location in San José, at the heart of Silicon Valley. This geographical positioning offers additional benefits by enabling participants to be in one of the world's leading technology hubs, where innovation and progress are part of everyday life. Proximity to numerous high-tech companies and research institutions fosters exchange and offers unparalleled networking opportunities.

The SPIE Advanced Lithography + Patterning is also regarded as an incubator for future technological developments and as a central meeting point for shaping the future of the semiconductor industry. With a combination of high-quality lectures, interactive courses, and a comprehensive exhibition, it provides participants with the opportunity to stay up-to-date on the latest technical developments and actively participate in the direction of the industry.

The SPIE Advanced Lithography + Patterning will take place on 5 days from Sunday, 22. February to Thursday, 26. February 2026 in San José.