SPIE Photomask Technology + EUV Lithography Monterey

The SPIE Photomask Technology + EUV Lithography is the leading global trade fair and conference for photomasks, EUV lithography, and related processes. It serves as a crucial platform for exchanges between experts from industry and academia. At the fair, the latest developments, innovative technologies, and current challenges in the field are presented and discussed. The acronym SPIE stands for "International Society for Optics and Photonics", which acts as the event organizer.

The event is held annually at the Monterey Marriott in Monterey, offering professionals and exhibitors an opportunity to stay informed about advancements and market trends.

The main topics of the fair include mask technologies such as inspection, repair, metrology, cleaning technologies, EUV lithography, nanoimprint techniques, direct write techniques, and wafer processing. Additionally, the latest tools, simulation software, resists, substrates, and etching materials are introduced. This broad range of topics establishes the fair as a central meeting point for the photomask industry.

The event attracts exhibitors and visitors from the fields of microelectronics, semiconductor technology, and nanotechnology, providing an important platform for both established companies and the academic community, including emerging talents. The latter benefit from special student zones, courses, and events such as the EUV Tech Student Award presentation.

A particular highlight is the BACUS Awards, which honor outstanding achievements in the industry and emphasize the importance of innovative research and development efforts.

The venue in Monterey, with its accessible location and attractive surroundings, along with the centrally located and excellently equipped Monterey Marriott, provides the ideal setting for this high-profile event.

In summary, the SPIE Photomask Technology + EUV Lithography is a significant platform for professional exchange, offering opportunities to discover the latest products and services and to connect with leading minds in the industry. It impressively demonstrates how continual innovations push the technological boundaries of microelectronics and related fields and redefine their possibilities.

The SPIE Photomask Technology + EUV Lithography will take place on 5 days from Sunday, 21. September to Thursday, 25. September 2025 in Monterey.