Photomask Japan Yokohama
05. - 07. April 2017 | Trade fair for photomasks and lithography
In 37 Days
professional visitors only
05.04.2017 - 07.04.2017*
Wednesday - Friday, 3 days
06. - 08. April 2016
20. - 22. April 2015
Photomask Japan is an international symposium and technical exhibition on photomasks and lithography in Japan. The aim of the symposium is to bring together engineers and investigators from all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and panel discussions. Photomask Japan is an ideal chance to introduce the equipment in connection with photomask technology, parts, material and software.
The twenty-fourth Photomask Japan takes place on 3 days from Wed., 05.04.2017 to Fri., 07.04.2017 in Yokohama.
Product groups: electron beam recorders, laser beam recorders, photomask blanks, photomask materials, photomask production equipment, photomasks, …
Industry sectors: Photography, …
Fairs of these Sectors: Conventions and Photography Trade Shows, …
Disclaimer: No responsibility is taken for the correctness of this information. Errors and alterations excepted! Fair dates and exhibition sites are subject to change by the respective trade fair organiser.
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