Photomask Japan Yokohama
06. - 08. April 2016 | Trade fair for photomasks and lithography
In 59 Days
professional visitors only
06.04.2016 - 08.04.2016*
Wednesday - Friday, 3 days
- 20. - 22. April 2015
Photomask Japan is an international symposium and technical exhibition on photomasks and lithography in Japan. The aim of the symposium is to bring together engineers and investigators from all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and panel discussions. Photomask Japan is an ideal chance to introduce the equipment in connection with photomask technology, parts, material and software.
Already for the twenty-third time the Photomask Japan takes place on 3 days from Wed., 06.04.2016 to Fri., 08.04.2016 in Yokohama.
Product groups: electron beam recorders, laser beam recorders, photomask blanks, photomask materials, photomask production equipment, photomasks, …
Industry sectors: Photography, …
Fairs of these Sectors: Conventions and Photography Trade Shows, …
Disclaimer: No responsibility is taken for the correctness of this information. Errors and alterations excepted! Fair dates and exhibition sites are subject to change by the respective trade fair organiser.
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