Photomask Japan Yokohama

05. - 07. April 2017 | Trade fair for photomasks and lithography

In 120 Days

Cycle:
annually

Audience:
professional visitors only

Date:
05.04.2017 - 07.04.2017*
Wednesday - Friday, 3 days
Past editions:
  • 06. - 08. April 2016
  • 20. - 22. April 2015

Photomask Japan is an international symposium and technical exhibition on photomasks and lithography in Japan. The aim of the symposium is to bring together engineers and investigators from all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and panel discussions. Photomask Japan is an ideal chance to introduce the equipment in connection with photomask technology, parts, material and software.

The twenty-fourth Photomask Japan takes place on 3 days from Wed., 05.04.2017 to Fri., 07.04.2017 in Yokohama.

Trade Show Contact
Display e-mail address
www.photomask-japan.org

Local time:
19:10 h (UTC +9)

Fair organizer
SPIE
1000 20th St
WA 98227 Bellingham, USA
Tel: +1 (3)60 6763290
Fax: +1 (3)60 6471445
Display e-mail address
spie.org

Product groups: electron beam recorders, laser beam recorders, photomask blanks, photomask materials, photomask production equipment, photomasks, …

Industry sectors: Photography, …

Fairs of these Sectors: Conventions and Photography Trade Shows, …

Disclaimer: No responsibility is taken for the correctness of this information. Errors and alterations excepted! Fair dates and exhibition sites are subject to change by the respective trade fair organiser.

220-0012 Yokohama,
Prefecture Kanagawa
Japan Japan

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